The GIK Centella Glossy Mask provides multi-effect repair and restoration for your skin, improving your skin's appearance and overall health. Enriched with Centella Asiatica extract, this mask provides calming relief, particularly effective after sun exposure. Its blend of regular moisturising ingredients, Golden Chamomile Extract, and fermented products like Diagonal yeast ensures deep hydration and skin conditioning. Additionally, the inclusion of tea extracts further enhances the mask's rejuvenating properties.
This mask is ideal for addressing skin dryness and irritation. The generous amount of essence works to regulate skin stress, while Centella Asiatica soothes and reduces inflammation. Suitable for dry, uneven, and sensitive skin, the GIK Centella Glossy Mask restores balance, improves texture, and provides a fresh, hydrated feel. Whether you need a quick recovery after sun exposure or a boost to your skin's moisture levels, this mask is a dependable choice for immediate and long-lasting relief. 21PCS.
How to use:
After cleansing and toning, place the mask on for five minutes before removal. This mask is best used every morning and night.